Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering
نویسندگان
چکیده
The laser damage resistance of optical coatings is a key point for a large number of applications. The aim of this work is to test and analyze the laser damage resistance of a thin film material commonly used for high power applications (SiO2) and deposited with different techniques: Electron Beam Deposition, Ion Assisted Deposition, Low Voltage Reactive Ion Plating and Dual Ion Beam Sputtering. The laser damage thresholds of these coatings were determined at 1064 nm and 355 nm using nanosecond pulsed YAG lasers, with a 1-on-1 test procedure. The results are then compared and discussed: we found different behaviours that we link to laser damage initiators of different nature and densities. The dense thin films (obtained with ion assistance) were found to be highly resistant to laser damage. © 2006 Elsevier B.V. All rights reserved.
منابع مشابه
Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering.
A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO(2) starting material), reactive low voltage ion plating, and dual ion beam sputtering. The laser damage thresholds of these coatings are determined at 1064 and 355 nm using a nanosecond pulsed YAG laser and a one...
متن کاملComparative study of IR and UV laser damage resistance of silica thin films deposited by Electron Beam deposition, Ion Plating, Ion Assisted Deposition and Dual Ion Beam Sputtering
The laser damage resistance of optical coatings is a critical point for a large number of applications. However improving this resistance is often hard to obtain because of the large number of parameters in the deposition processes than can modify the laser damage threshold and the lack of detailed and exploitable studies published on this subject. Then, the aim of this work is to test and anal...
متن کاملStress-induced formation of high-density amorphous carbon thin films
Amorphous carbon films with high sp content were deposited by magnetron sputtering and intense argon ion plating. Above a compressive stress of 13 GPa a strong increase of the density of the carbon films is observed. We explain the increase of density by a stress-induced phase transition of sp configured carbon to sp configured carbon. Preferential sputtering of the sp component in the carbon f...
متن کاملInfluence of Ni Deposition and Subsequent N+ Ion Implantation at Different Implantation Energies on Nano-Structure and Corrosion Behavior of 316 Stainless Steels
Nickel films of 300 nm thickness were deposited by electron beam evaporation at room temperature on 316 stainless steels. Corrosion studies of Ni coated 316 SS have been performed after N+ ion implantation at different energies of 20, 40, 60 and 80 keV. The structure and surface morphology of the films were evaluated using X-ray diffraction (XRD), atomic force microscope (AFM) an...
متن کاملEffect of Thickness on Structural and Morphological Properties of AlN Films Prepared Using Single Ion Beam Sputtering
Aluminum nitride (AlN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, AlN thin films with different thicknesses were deposited on silicon substrate by single ion beam sputtering method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of - nm was amorphous, while the polycrystalline hexagonal AlN with a...
متن کامل